Award History

Home > Award History

Award History

Certified for the Tokyo Trial Order Certification System
Award Date August 20, 2009
Presented by Tokyo Metropolitan Bureau of Industrial and Labor Affairs
URL http://www.sangyo-rodo.metro.tokyo.jp/shoko/sogyo/trial.html
Reason for Award Development of innovative technology: Daiwa Osmium Aperture Plate
2009 Thriving SME Manufacturers 300 - Letter of Appreciation
Award Date June 3, 2009
Presented by Ministry of Economy, Trade, and Industry
URL http://www.chusho.meti.go.jp/keiei/sapoin/mono2009/index.html
Reason for Award Recognized as an SME manufacturer supporting Japanese innovation
"Tokyo Venture Tech Awards" Excellence Award
Award Date 25.11.08
Presented by Tokyo Metropolitan Bureau of Industrial and Labor Affairs
URLhttp://www.metro.tokyo.jp/INET/OSHIRASE/2008/11/20ibp200.htm
Reason for Award - Innovative! Development of osmium coating technology for metal surfaces via plasma CVD technique
2007 R&D Support Project
Award Date29.10.07
Presented byMitsubishi Tokyo UFJ Technology Development Foundation
URLhttp://www.mutech.or.jp/
Reason for Award- Development of osmium coating technology
Details Received support funds for our development of osmium coating technology
4th "Brave Management Awards" Excellence Award
Award Date12.10.06
Presented byTokyo Chamber of Commerce
URLhttp://www.tokyo-cci.or.jp/chusho/keieitaisyo/kekka/4/daiwa.html
Reason for Award- Contributed to the improvement of scientific equipment through the development of our proprietary aperture plate processing technology.
- Furthermore, through the development of our osmium coating technology, we made it possible for maintenance to be conducted during continuous operation, thus contributing to total cost reduction through the reduced of maintenance labor.
1st "Machida Economic Innovations Awards" Grand Prize
Award Date15.03.06
Presented byMachida Chamber of Commerce
URLhttp://www.machida-cci.or.jp/eventinfo/daiwa.html
Reason for Award- Development of advanced technology: opened world's smallest hole (3 microns) in aperture plate used to gather electron beams in an electron microscope
- By coating aperture plates using our proprietary osmium coating process, we were able to resolve problems caused by dirt and warping thereby improving product lifespan and ensuring high quality.

Return to Top of Page

Copyright (C) 2011 DaiwatechnoSystems Co., Ltd. All Rights Reserved.